Deposition of single-crystal Ti2AlN thin films by reactive magnetron sputtering from a 2Ti:Al compound target
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2785958
Reference26 articles.
1. A review of the present state of art in hard coatings grown from the vapor phase
2. Properties of single layer and gradient (Ti,Al)N coatings
3. The MN+1AXN phases: A new class of solids
4. Ti2AlN, eine stickstoffhaltige H-Phase
5. New compounds with eulytine structure: Crystal chemistry and luminescence
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