Effect of deuterium postmetal annealing on the reliability characteristics of an atomic-layer-deposited HfO2/SiO2 stack gate dielectrics
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1523636
Reference12 articles.
1. Low‐temperature annealing and hydrogenation of defects at the Si–SiO2 interface
2. The effect of hydrogen on trap generation, positive charge trapping, and time-dependent dielectric breakdown of gate oxides
3. Reduction of hot electron degradation in metal oxide semiconductor transistors by deuterium processing
4. Deuterium post-metal annealing of MOSFET's for improved hot carrier reliability
Cited by 21 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Oxygen vacancy and hydrogen in amorphous HfO2;Journal of Physics D: Applied Physics;2023-04-11
2. Improvement of Device Reliability and Variability Using High Pressure Deuterium Annealing;Transactions on Electrical and Electronic Materials;2022-11-04
3. Effect of Annealing Temperature on the Microstructure and Optical Properties of Lanthanum-Doped Hafnium Oxide;Coatings;2022-03-24
4. Annealing-temperature-modulated optical, electrical properties, and leakage current transport mechanism of sol–gel-processed high-k HfAlOx gate dielectrics;Ceramics International;2017-02
5. Baking-temperature-modulated optical and electrical properties of HfTiOx gate dielectrics via sol-gel method;Journal of Alloys and Compounds;2016-12
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3