Electron mean free path in elemental metals-Reference-Cited by-同舟云学术

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Electron mean free path in elemental metals

Published:2016-02-28 Issue:8 Volume:119 Page:085101
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Gall Daniel¹

Affiliation:

1. Department of Materials Science and Engineering, Rensselaer Polytechnic Institute, Troy, New York 12180, USA

Funder

National Science Foundation (NSF)

Semiconductor Research Corporation (SRC)

Microelectronics Advanced Research Corporation (MARCO)

Defense Sciences Office, DARPA (DSO, DARPA)

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://scitation.aip.org/deliver/fulltext/aip/journal/jap/119/8/1.4942216.pdf?itemId=/content/aip/journal/jap/119/8/10.1063/1.4942216&mimeType=pdf&containerItemId=content/aip/journal/jap

Reference44 articles.

1. Influence of phonon, geometry, impurity, and grain size on Copper line resistivity

2. Resistivity dominated by surface scattering in sub-50 nm Cu wires

3. Surface and grain boundary scattering in nanometric Cu thin films: A quantitative analysis including twin boundaries

4. Electron scattering at surfaces and grain boundaries in Cu thin films and wires

5. Low-Resistivity 10 nm Diameter Magnetic Sensors

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5. Plasma atomic layer etching of ruthenium by oxygen adsorption-removal cyclic process;Applied Surface Science;2024-10

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