Band structure, effective mass, and carrier mobility of few-layer h-AlN under layer and strain engineering

Author:

Cai Yao1ORCID,Liu Yan1,Xie Ying1,Zou Yang1ORCID,Gao Chao1,Zhao Yan1,Liu Sheng1,Xu Hongxing2,Shi Jian3,Guo Shishang2,Sun Chengliang1ORCID

Affiliation:

1. The Institute of Technological Sciences, Wuhan University, Wuhan 430072, People’s Republic of China

2. Key Laboratory of Artificial Micro- and Nano-Structures of Ministry of Education, School of Physics and Technology, Wuhan University, Wuhan 430072, People’s Republic of China

3. Department of Materials Science and Engineering, Rensselaer Polytechnic Institute, Troy, New York 12180, USA

Funder

Hubei Provincial Major Program of Technological Innovation

China Scholarship Council

National Natural Science Foundation of China

Publisher

AIP Publishing

Subject

General Engineering,General Materials Science

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