Optical and structural properties of SiOxNyHz films deposited by electron cyclotron resonance and their correlation with composition
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1566476
Reference44 articles.
1. Deposition of single phase, homogeneous silicon oxynitride by remote plasma-enhanced chemical vapor deposition, and electrical evaluation in metal–insulator–semiconductor devices
2. A new method to fabricate thin oxynitride/oxide gate dielectric for deep submicron devices
3. Role of interfacial nitrogen in improving thin silicon oxides grown in N2O
4. Effect of Nitrogen Profile on Tunnel Oxynitride Degradation with Charge Injection Polarity
5. Characterization of Silicon‐Oxynitride Films Deposited by Plasma‐Enhanced CVD
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1. Effect of deposition conditions on physical properties of sputtered silicon oxynitride thin films on float glass;International Journal of Applied Glass Science;2018-03-08
2. Deposition of silicon nitride films using chemical vapor deposition for photovoltaic applications;Results in Physics;2016
3. In-situ structural investigation of non-stoichiometric HfO2-x films using quick-scanning extended X-ray absorption fine structure;Thin Solid Films;2013-07
4. Compositional dependence of trap density and origin in thin silicon oxynitride film investigated using spin dependent Poole–Frenkel current;Applied Physics Letters;2011-06-06
5. Physico-chemical, structural and physical properties of hydrogenated silicon oxinitride films elaborated by pulsed radiofrequency discharge;Thin Solid Films;2010-05
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