Coimplantation and electrical activity of C in GaAs: Stoichiometry and damage effects

Author:

Moll A. J.,Yu Kin Man,Walukiewicz W.,Hansen W. L.,Haller E. E.

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Cited by 34 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Co-implantation of Al+, P+, and S+ with Si+ implants into In0.53Ga0.47As;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2015-09

2. (Invited) A Brief Review of Doping Issues in III-V Semiconductors;ECS Transactions;2013-05-03

3. Enhanced efficiency in GaInP/GaAs tandem solar cells using carbon doped GaAs in tunnel junction;Microelectronic Engineering;2010-04

4. Parameter study of intrinsic carbon doping of AlxGa1−xAs by MOCVD;Journal of Crystal Growth;2004-11

5. Comparative study of MeV C[sup +] and C[sub 2][sup +] ion implantation in GaAs(100): Surface roughness and evaluation of lattice strain;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2003

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