Formation and morphological stability of NiSi in the presence of W, Ti, and Ta alloying elements
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2433133
Reference36 articles.
1. High-temperature degradation of NiSi films: Agglomeration versus NiSi2 nucleation
2. Reduction of the C54–TiSi2 phase transformation temperature using refractory metal ion implantation
3. Reaction of silicon with films of CoNi alloys: Phase separation of the monosilicides and nucleation of the disilicides
4. Effects of alloying elements on cobalt silicide formation
5. Formation of epitaxial CoSi2 by a Cr or Mo interlayer: Comparison with a Ti interlayer
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