Hard x-ray photoelectron spectroscopy study of the buried Si/ZnO thin-film solar cell interface: Direct evidence for the formation of Si–O at the expense of Zn-O bonds-Reference-Cited by-同舟云学术

Hard x-ray photoelectron spectroscopy study of the buried Si/ZnO thin-film solar cell interface: Direct evidence for the formation of Si–O at the expense of Zn-O bonds

Published:2011-10-10 Issue:15 Volume:99 Page:152104
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Wimmer M.,Bär M.,Gerlach D.,Wilks R. G.,Scherf S.,Lupulescu C.,Ruske F.,Félix R.,Hüpkes J.,Gavrila G.,Gorgoi M.,Lips K.,Eberhardt W.,Rech B.

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.3644084

Reference18 articles.

1. Crystallization kinetics in electron-beam evaporated amorphous silicon on ZnO:Al-coated glass for thin film solar cells

2. Microstructure and photovoltaic performance of polycrystalline silicon thin films on temperature-stable ZnO:Al layers

3. Improved electrical transport in Al-doped zinc oxide by thermal treatment

4. Texture etched ZnO:Al coated glass substrates for silicon based thin film solar cells

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