Morphological design of complex oxides during pulsed-laser deposition: The role of plasma-plume expansion
Author:
Affiliation:
1. Materials Science and Engineering, University of Michigan, Ann Arbor, Michigan 48109, USA
2. School of Electrical Engineering, Ben-Gurion University, Beer Sheva 84105, Israel
Funder
National Science Foundation
Binational Science Foundation
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.5119922
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1. Bottom-up growth of fully transparent contact layers of indium tin oxide nanowires for light-emitting devices
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