Particle model analyses of N2O dilution with He on electrical characteristics of radio-frequency discharges
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3125442
Reference39 articles.
1. Plasma chemistry of He/O2/SiH4and He/N2O/SiH4mixtures for remote plasma‐activated chemical‐vapor deposition of silicon dioxide
2. Plasma chemistry of He/O2/SiH4and He/N2O/SiH4mixtures for remote plasma‐activated chemical‐vapor deposition of silicon dioxide
3. Plasma chemistry of He/O2/SiH4and He/N2O/SiH4mixtures for remote plasma‐activated chemical‐vapor deposition of silicon dioxide
4. Characterization of Plasma‐Deposited Silicon Dioxide
5. Production of silicon oxides from the glow discharge decomposition of silane and NO2
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