Short range atomic migration in amorphous silicon-Reference-Cited by-同舟云学术

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Short range atomic migration in amorphous silicon

Published:2016-05-07 Issue:17 Volume:119 Page:175102
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Strauß F.¹,Jerliu B.¹,Geue T.²^ORCID,Stahn J.²,Schmidt H.¹³

Affiliation:

1. AG Mikrokinetik, Institut für Metallurgie, TU Clausthal, D-38678 Clausthal-Zellerfeld, Germany

2. Laboratory for Neutron Scattering and Imaging, Paul Scherrer Institute, Villigen, CH-5232, Switzerland

3. Clausthaler Zentrum für Materialtechnik, TU Clausthal, D-38678 Clausthal-Zellerfeld, Germany

Funder

European Commission (EC)

Deutsche Forschungsgemeinschaft (DFG)

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4948333

Reference36 articles.

1. Photovoltaic Technology: The Case for Thin-Film Solar Cells

2. Key issues for fabrication of high quality amorphous and microcrystalline silicon solar cells

3. The physics of amorphous-silicon thin-film transistors

4. Amorphous silicon thin-film transistors on compliant polyimide foil substrates

5. 25th Anniversary Article: Understanding the Lithiation of Silicon and Other Alloying Anodes for Lithium-Ion Batteries

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1. Thin‐Film Oxynitride Photocatalysts for Solar Hydrogen Generation: Separating Surface and Bulk Effects Using Synchrotron X‐Ray and Neutron‐Based Techniques;Solar RRL;2022-07-15

2. Examining normal modes as fundamental heat carriers in amorphous solids: The case of amorphous silicon;Journal of Applied Physics;2021-08-07

3. Examining the surface evolution of LaTiOxNy an oxynitride solar water splitting photocatalyst;Nature Communications;2020-04-07

4. In-situ Measurement of Self-Atom Diffusion in Solids Using Amorphous Germanium as a Model System;Scientific Reports;2018-12

5. Self-Diffusion in Amorphous Silicon by Local Bond Rearrangements;Physical Review Letters;2018-05-31

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