New high‐resolution charge transfer x‐ray and electron beam negative resist

Author:

Hofer Donald C.,Kaufman Frank B.,Kramer Steven R.,Aviram Ari

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Cited by 22 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. A numeric model for the imaging mechanism of metal oxide EUV resists;SPIE Proceedings;2017-03-27

2. Recent Developments in the Chemistry of Lithography for Electronics Production;Plastics for Electronics;1999

3. Electron beam and X-ray resists;Advanced Materials for Optics and Electronics;1994-03

4. SWELLING OF NEGATIVE RESIST SYSTEMS USED IN E-BEAM LITHOGRAPHY†;Chemical Engineering Communications;1990-12

5. Exposure characteristics of high-resolution negative resists;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1990-11

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