New high‐resolution charge transfer x‐ray and electron beam negative resist
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.91918
Reference8 articles.
1. 250‐Å linewidths with PMMA electron resist
2. Sensitive chlorine-containing resists for X-ray lithography
3. Chloromethylated Polystyrene as a Dry Etching‐Resistant Negative Resist for Submicron Technology
4. Formation of highly conducting organic salts by photooxidation of heterofulvalene .pi.-donors in halocarbon solutions
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