Relative angle determinable stitching interferometry for hard x-ray reflective optics-Reference-Cited by-同舟云学术

Relative angle determinable stitching interferometry for hard x-ray reflective optics

Published:2005-04 Issue:4 Volume:76 Page:045102
ISSN:0034-6748
Container-title:Review of Scientific Instruments
language:en
Short-container-title:Review of Scientific Instruments

Author:

Mimura Hidekazu,Yumoto Hirokatsu,Matsuyama Satoshi,Yamamura Kazuya,Sano Yasuhisa,Ueno Kazumasa,Endo Katsuyoshi,Mori Yuzo,Yabashi Makina,Tamasaku Kenji,Nishino Yoshinori,Ishikawa Tetsuya,Yamauchi Kazuto

Publisher

AIP Publishing

Subject

Instrumentation

Link

http://aip.scitation.org/doi/pdf/10.1063/1.1868472

Reference15 articles.

1. High-efficiency multilevel zone plates for keV X-rays

2. Submicron focusing of hard x rays with reflecting surfaces at the ESRF

3. Elliptical x-ray microprobe mirrors by differential deposition

4. Two-dimensional Submicron Focusing of Hard X-rays by Two Elliptical Mirrors Fabricated by Plasma Chemical Vaporization Machining and Elastic Emission Machining

5. Precision optical asphere fabrication by plasma jet chemical etching (PJCE) and ion beam figuring

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