Electric field induced migration of native point defects in Ga2O3 devices

Author:

Haseman Micah S.1ORCID,Ramdin Daram N.1ORCID,Li Wenshen2ORCID,Nomoto Kazuki2ORCID,Jena Debdeep234ORCID,Xing Huili Grace234ORCID,Brillson Leonard J.15ORCID

Affiliation:

1. Department of Physics, The Ohio State University 1 , Columbus, Ohio 43210, USA

2. School of Electrical and Computer Engineering, Cornell University 2 , Ithaca, New York 14853, USA

3. Department of Materials Science and Engineering, Cornell University 3 , Ithaca, New York 14853, USA

4. Kavli Institute at Cornell for Nanoscale Science, Cornell University 4 , Ithaca, New York 14853, USA

5. Department of Electrical and Computer Engineering, The Ohio State University 5 , Columbus, Ohio 43210, USA

Abstract

While the properties of β-Ga2O3 continue to be extensively studied for high-power applications, the effects of strong electric fields on the Ga2O3 microstructure and, in particular, the impact of electrically active native point defects have been relatively unexplored. We used cathodoluminescence point spectra and hyperspectral imaging to explore possible nanoscale movements of electrically charged defects in Ga2O3 vertical trench power diodes and observed the spatial rearrangement of optically active defects under strong reverse bias. These observations suggest an unequal migration of donor-related defects in β-Ga2O3 due to the applied electric field. The atomic rearrangement and possible local doping changes under extreme electric fields in β-Ga2O3 demonstrate the potential impact of nanoscale device geometry in other high-power semiconductor devices.

Funder

Air Force Office of Scientific Research

Division of Materials Research

Division of Electrical, Communications and Cyber Systems

Publisher

AIP Publishing

Subject

General Physics and Astronomy

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