High-performance metal-insulator-metal capacitor with Ge-stabilized tetragonal ZrO2/amorphous La-doped ZrO2 dielectric
Author:
Funder
National Science Council Taiwan
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3535605
Reference17 articles.
1. PVD HfO2 for high-precision MIM capacitor applications
2. Atomic layer deposition of ZrO2 on W for metal–insulator–metal capacitor application
3. High-density MIM capacitors using Al2O3 and AlTiOx dielectrics
4. High-density MIM capacitors using AlTaOx dielectrics
5. High-Density RF MIM Capacitors Using High-k La[sub 2]O[sub 3] Dielectrics
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