Hydrogenation kinetics and defect termination of post‐plasma‐treated chemical‐vapor‐deposited amorphous silicon film
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.342699
Reference26 articles.
1. Hydrogenation and dehydrogenation of amorphous and crystalline silicon
2. Hydrogenation of evaporated amorphous silicon films by plasma treatment
3. Hydrogenation and doping of vacuum-evaporated a-Si
4. Hydrogen Implantation into CVD Amorphous Silicon
5. High current post‐hydrogenated chemical vapor deposited amorphous siliconp‐i‐ndiodes
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