Depletion of the In2O3(001) and (111) surface electron accumulation by an oxygen plasma surface treatment-Reference-Cited by-同舟云学术

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Depletion of the In2O3(001) and (111) surface electron accumulation by an oxygen plasma surface treatment

Published:2011-04-25 Issue:17 Volume:98 Page:172101
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Bierwagen Oliver,Speck James S.,Nagata Takahiro,Chikyow Toyohiro,Yamashita Yoshiyuki,Yoshikawa Hideki,Kobayashi Keisuke

Funder

Air Force Office of Scientific Research

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.3583446

Reference18 articles.

1. Plasma-assisted molecular beam epitaxy of high quality In2O3(001) thin films on Y-stabilized ZrO2(001) using In as an auto surfactant

2. Nucleation of islands and continuous high-quality In2O3(001) films during plasma-assisted molecular beam epitaxy on Y-stabilized ZrO2(001)

3. High electron mobility In2O3(001) and (111) thin films with nondegenerate electron concentration

4. Band gap, electronic structure, and surface electron accumulation of cubic and rhombohedralIn2O3

5. Surface Electron Accumulation and the Charge Neutrality Level inIn2O3

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3. Impact of controlling the barrier height on fabrication of high performance β-Ga2O3 solar-blind photodetectors;Applied Physics A;2023-08

4. Tuning the Surface Electron Accumulation Layer of In₂O₃ by Adsorption of Molecular Electron Donors and Acceptors;Small;2023-04-20

5. Growth of α-In₂O₃ films with different concentrations of In₂O₃ powder used as source precursor by mist chemical vapor deposition;Japanese Journal of Applied Physics;2023-04-19

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