Mechanism for atmosphere dependence of laser damage morphology in HfO2/SiO2 high reflective films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4737405
Reference23 articles.
1. Femtosecond laser pulse induced breakdown in dielectric thin films
2. Analysis of laser-induced damage threshold in dielectric optical film
3. Single-shot measurement of laser-induced damage thresholds of thin film coatings
4. Influence of process conditions on the optical properties HfO 2 /SiO 2 thin films for high power laser coatings
5. Laser-induced damage thresholds and optical constants of ion-plated and ion-beam-sputtered Al 2 O 3 and HfO 2 coatings for the ultraviolet
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2. Heterostructure Films of SiO2 and HfO2 for High-Power Laser Optics Prepared by Plasma-Enhanced Atomic Layer Deposition;Coatings;2023-01-26
3. Investigating the material properties of HfO2/SiO2-based anti-reflection coatings during 1064 nm laser-induced breakdown in air and vacuum conditions;Optics & Laser Technology;2023-01
4. Review: Research progress on nanosecond laser irradiation damage of optical films;Nuclear Analysis;2022-12
5. Material ejection and layer peeling-off in HfO2/SiO2 thin-film beam splitters induced by 1ω and 3ω lasers;Optical Materials;2022-03
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