Electron cyclotron resonance microwave discharge for oxide deposition using tetramethylcyclotetrasiloxane
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.354074
Reference11 articles.
1. Ion and chemical radical effects on the step coverage of plasma enhanced chemical vapor deposition tetraethylorthosilicate films
2. Mobile Charge in a Novel Spin‐On Oxide (SOX): Detection of Hydrogen in Dielectrics
3. Low Temperature Chemical Vapor Deposition Method Utilizing an Electron Cyclotron Resonance Plasma
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