Ultrasonic Relaxation Loss in OH‐Free SiO2
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1713633
Reference4 articles.
1. Measurement of Elastic Constants at Low Temperatures by Means of Ultrasonic Waves–Data for Silicon and Germanium Single Crystals, and for Fused Silica
2. Ultrasonic Absorption in Fused Silica at Low Temperatures and High Frequencies
3. Investigation of Low-Temperature Ultrasonic Absorption in Fast-Neutron Irradiated SiO2Glass
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1. The Influence of Water on the Glass Properties;Glass Physics and Chemistry;2004-09
2. Chlorination and vaporization of GeO2 component in SiO2:GeO2 porous preform in dehydration process by VAD method and spontaneous formation of SiO2 cladding layer during the dehydration by selective vaporization of GeO2;Journal of Non-Crystalline Solids;1996-01
3. Near Infrared Absorption Spectra of Silica: OH Overtones;Applied Spectroscopy;1971-05
4. Acoustic Loss of Vitreous Silica at Elevated Temperatures;Journal of Applied Physics;1970-01
5. Optical Determinations of OH in Fused Silica;Journal of Applied Physics;1966-09
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