Laser‐induced etching of Si with chlorine
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.337142
Reference19 articles.
1. Laser‐induced microscopic etching of GaAs and InP
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5. Multiple photon excited SF6 interaction with silicon surfaces
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1. Pulsed laser induced atomic layer etching of silicon;Journal of Vacuum Science & Technology A;2023-03
2. Temperature dependence on plasma-induced damage and chemical reactions in GaN etching processes using chlorine plasma;Japanese Journal of Applied Physics;2018-05-18
3. STM observations of photo-induced jumps of chlorine atoms chemisorbed on Si(111)-(7×7) surface;Surface Science;2005-11
4. The atomic processes of ultraviolet laser-induced etching of chlorinated silicon (1 1 1) surface;Applied Surface Science;2002-09
5. Laser-induced mono-atomic-layer etching on Cl-adsorbed Si(111) surfaces;Applied Surface Science;1998-06
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