Properties and structures of diamond-like carbon film deposited using He, Ne, Ar/methane mixture by plasma enhanced chemical vapor deposition
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.373507
Reference28 articles.
1. Diamondlike carbon deposition on silicon using radio-frequency inductive plasma of Ar and C2H2 gas mixture in plasma immersion ion deposition
2. Deposition of diamond-like carbon film in CH4He r.f. plasma
3. Structure changes in a-C:H films in inductive CH4/Ar plasma deposition
4. Deposition of DLC films in and r.f. plasmas
5. High rate deposition of diamond-like carbon films by magnetically enhanced plasma CVD
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3. Studying the effects of plasma produced species on the optical characteristics and bonding structure of diamond-like carbon films deposited by direct current unbalanced magnetron sputtering;Materials Chemistry and Physics;2019-05
4. Effects of the Ar and He dilution gas mixture ratio on the hardness of a-C:H films synthesized by atmospheric pressure plasma enhanced chemical vapor deposition;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2017-07
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