Ga0.51In0.49P/InxGa1−xAs/GaAs lattice-matched and strained doped-channel field-effect transistors grown by gas source molecular beam epitaxy
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.369527
Reference20 articles.
1. Characterization of ultra-high-speed pseudomorphic AlGaAs/InGaAs (on GaAs) MODFETs
2. Ultralow-noise W-band pseudomorphic InGaAs HEMT's
3. Millimeter-wave GaAs power FET with a pulse-doped InGaAs channel
4. A double-heterojunction doped-channel pseudomorphic power HEMT with a power density of 0.85 W/mm at 55 GHz
5. High-breakdown-voltage Ga0.51In0.49P/GaAs I-HEMT and I2HEMT with a GaInP passivation layer grown by gas source molecular beam epitaxy
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1. A numerical study of dc characteristics of HEMT with p -type δ -doped barrier;Applied Physics A;2005-09
2. Coplanar waveguides supported by InGaP and GaAs/AlGaAs membrane-like bridges;Journal of Micromechanics and Microengineering;2002-06-14
3. GaAs Cantilever and Bridge Membrane-Like Structures Fully Compatible with AlGaAs/InGaAs/GaAs and InGaP/InGaAs/GaAs Based HFETs;Microsystems;2002
4. Technology and performance of 150nm gate length InGaP/InGaAs/GaAs pHEMTs;Vacuum;2001-05
5. Fabrication of strained and double heterojunction In/sub x/Ga/sub 1-x/P/In/sub 0.2/Ga/sub 0.8/As high electron mobility transistors grown by solid-source molecular beam epitaxy;IEEE Transactions on Electron Devices;2000-05
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