The effect of surface nucleation on the evolution of crystalline microstructure during solid phase crystallization of amorphous Si films on SiO2
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.119437
Reference10 articles.
1. Polycrystalline-silicon device technology for large-area electronics
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4. TEM Observations of Initial Crystallization States for LPCVD Si Films
5. Structure and crystallization of low‐pressure chemical vapor deposited silicon films using Si2H6 gas
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