Study of interface roughness dependence of electron mobility in Si inversion layers using the Monte Carlo method
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Reference20 articles.
1. Normal Electric Field Dependence of Electron Mobility in MOS Inversion Layer
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3. High‐field drift velocity of electrons at the Si–SiO2interface as determined by a time‐of‐flight technique
4. Electron scattering in silicon inversion layers by oxide and surface roughness
5. Electron Mobility in Si Inversion Layers
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