Enhanced diffusion processes during ion implantation: A numerical analysis
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.332528
Reference6 articles.
1. Ion-beam-induced migration and its effect on concentration profiles
2. Optical, chemical and mechanical modifications induced by ion implantation on glass surfaces
3. Sputtering process during ion implantation in glasses: mathematical and physical analysis
4. Sputtering of PtSi
5. Spatial distribution of energy deposited into atomic processes in ion-implanted silicon
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1. Numerical Simulation of Thermal Processes and the Effect of Heating of Near-Surface Layers of Titanium on the Diffusion Transfer of Dopants during High-Intensity Pulsed Ion Implantation;Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques;2023-12
2. Composition and structure of Al ions implanted Fe at elevated temperatures;Surface and Coatings Technology;2007-04
3. The radiation stimulated diffusion role in high dose, low energy, high temperature ion implantation;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1997-05
4. Transport processes in solids during ion implantation;Materials Science and Engineering: A;1989-08
5. Analysis of temperature and enhanced diffusion effects in sputtering of CrSi2;Applied Physics A;1986-06
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