Lack of correlation between C-V hysteresis and capacitance frequency dispersion in accumulation of metal gate/high-k/n-InGaAs metal-oxide-semiconductor stacks-Reference-Cited by-同舟云学术

Lack of correlation between C-V hysteresis and capacitance frequency dispersion in accumulation of metal gate/high-k/n-InGaAs metal-oxide-semiconductor stacks

Published:2018-12-14 Issue:22 Volume:124 Page:224102
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Pazos S. M.¹²^ORCID,Aguirre F. L.¹²^ORCID,Tang K.³,McIntyre P.³,Palumbo F.¹²^ORCID

Affiliation:

1. Unidad de Investigación y Desarrollo de las Ingenierías, Facultad Regional Buenos Aires, Universidad Tecnológica Nacional (UIDI FRBA-UTN), Medrano 951, C1179AAQ Buenos Aires, Argentina

2. Consejo Nacional de Investigaciones Científicas y Técnicas, Godoy Cruz 2290, C1425FQB Buenos Aires, Argentina

3. Department of Materials Science and Engineering, Stanford University, Stanford, California 94305, USA

Funder

Consejo Nacional de Investigaciones Científicas y Técnicas

Ministerio de Ciencia, Tecnología e Innovación Productiva

Universidad Tecnológica Nacional

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.5031025