Shortening of electron conduction pulses by electron attacher C3F8in Ar, N2, and CH4

Author:

Wang W. C.,Lee L. C.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Electron Interactions with CF4, C2F6, and C3F8;Fundamental Electron Interactions with Plasma Processing Gases;2004

2. Electron Interactions With C3F8;Journal of Physical and Chemical Reference Data;1998-09

3. Basic physics of gaseous dielectrics;IEEE Transactions on Electrical Insulation;1990

4. Electron attachment rate constants of HBr, CH3Br, and C2H5Br in N2and Ar;Journal of Applied Physics;1988-05-15

5. Electron attachment rate constants of SOCl2 in Ar, N2, and CH4;The Journal of Chemical Physics;1986-12

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