Resolving the nanostructure of plasma-enhanced chemical vapor deposited nanocrystalline SiOx layers for application in solar cells-Reference-Cited by-同舟云学术

Resolving the nanostructure of plasma-enhanced chemical vapor deposited nanocrystalline SiOx layers for application in solar cells

Author:

Klingsporn M.¹,Kirner S.²,Villringer C.³^ORCID,Abou-Ras D.⁴,Costina I.¹,Lehmann M.⁵,Stannowski B.²^ORCID

Affiliation:

1. IHP, Im Technologiepark 25, 15236 Frankfurt (Oder), Germany

2. PVcomB, Helmholtz-Zentrum Berlin für Materialien und Energie, Schwarzschildstr. 3, 12489 Berlin, Germany

3. Technische Hochschule Wildau, Hochschulring 1, 15745 Wildau, Germany

4. Helmholtz-Zentrum Berlin für Materialien und Energie, Hahn-Meitner-Platz 1, 15109 Berlin, Germany

5. Institut für Optik und Atomare Physik, Technische Universität Berlin, Straße des 17. Juni 135, 10623 Berlin, Germany

Funder

Federal ministry of education and research Germany

State government of Berlin (Senat)

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

Reference45 articles.

Cited by 24 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献