Stoichiometry measurement and electric characteristics of thin‐film Ta2O5insulator for ultra‐large‐scale integration
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.354120
Reference8 articles.
1. Promising storage capacitor structures with thin Ta/sub 2/O/sub 5/ film for low-power high-density DRAMs
2. Dielectric Characteristics of Double Layer Structure of Extremely Thin Ta2 O 5 / SiO2 on Si
3. Chemical Vapor Deposition of Tantalum Pentoxide Films for Metal‐Insulator‐Semiconductor Devices
4. Photo-Process of Tantalum Oxide Films and Their Characteristics
5. UV-O/sub 3/ and dry-O/sub 2/: Two-step-annealed chemical vapor-deposited Ta/sub 2/O/sub 5/ films for storage dielectrics of 64-Mb DRAMs
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1. Annealing temperature-dependent structural and electrical properties of (Ta2O5)1-x - (TiO2)x thin films, x ≤ 0.11;Ceramics International;2021-05
2. Investigation of Ta2O5 as an Alternative High- ${k}$ Dielectric for InAlN/GaN MOS-HEMT on Si;IEEE Transactions on Electron Devices;2019-03
3. STRUCTURAL AND ELECTRICAL PROPERTIES OF TANTALUM PENTAOXIDE (Ta2O5) THIN FILMS – A REVIEW;International Journal of Modern Physics: Conference Series;2013-01
4. Effect of growth and annealing temperatures on crystallization of tantalum pentoxide thin film prepared by RF magnetron sputtering method;Journal of Alloys and Compounds;2009-05
5. Plasma-assisted chemical vapor deposited silicon oxynitride as an alternative material for gate dielectric in MOS devices;Microelectronics Journal;2006-01
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