Hydrogen radical assisted chemical vapor deposition of ZnSe
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.96752
Reference5 articles.
1. Growth and doping of ZnSe and ZnSxSe1-x by organometallic chemical vapor deposition
2. Plasma‐enhanced metalorganic chemical vapor deposition ofc‐axis oriented and epitaxial films of ZnO at low substrate temperatures
3. Laser induced deposition of zinc oxide
4. Kinetics of atomic hydrogen reactions in the gas phase
5. Organometallic vapor deposition of epitaxial ZnSe films on GaAs substrates
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1. Growth of crystalline SiC films by triode plasma CVD using an organosilicon compound;Electronics and Communications in Japan (Part II: Electronics);1999-02
2. Atomic hydrogen-induced chemical vapor deposition of a-Si:C:H thin-film materials from alkylsilane precursors;Diamond and Related Materials;1997-07
3. Preparation and Deposition Mechanism of a ‐ SiC : H Films by Using Hexamethyldisilane in a Remote H 2 Plasma;Journal of The Electrochemical Society;1994-10-01
4. Remote hydrogen plasma chemical vapor deposition using an organopentasilane cluster as a novel film‐forming precursor: Mechanism of the activation step;Journal of Applied Physics;1994-07
5. Radical-assisted metalorganic chemical vapor deposition of ZnSe;Journal of Crystal Growth;1994-07
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