Morphological evolution of voids by surface drift diffusion driven by the capillary, electromigration, and thermal-stress gradient induced by the steady state heat flow in passivated metallic thin films and flip-chip solder joints. II. Applications
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2958303
Reference44 articles.
1. Motions of Microscopic Surfaces in Materials
2. Stress analysis of encapsulated fine‐line aluminum interconnect
3. Stress in metal lines under passivation; comparison of experiment with finite element calculations
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3. Finite-element simulation of a phase-field model for inclusion electromigration in {110}-oriented single crystal metal interconnects due to interface diffusion anisotropy;Applied Physics A;2022-06-27
4. A theoretical analysis to current exponent variation regularity and electromigration-induced failure;Journal of Applied Physics;2017-02-14
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