External control of electron energy distributions in a dual tandem inductively coupled plasma-Reference-Cited by-同舟云学术

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External control of electron energy distributions in a dual tandem inductively coupled plasma

Published:2015-08-27 Issue:8 Volume:118 Page:083303
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:J. Appl. Phys.

Author:

Liu Lei¹^ORCID,Sridhar Shyam¹,Zhu Weiye¹,Donnelly Vincent M.¹,Economou Demetre J.¹,Logue Michael D.²^ORCID,Kushner Mark J.²

Affiliation:

1. Plasma Processing Laboratory, Department of Chemical and Biomolecular Engineering, University of Houston, Houston, Texas 77204-4004, USA

2. Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, Michigan 48109-2122, USA

Funder

National Science Foundation (NSF)

Semiconductor Research Corporation (SRC)

U.S. Department of Energy (Department of Energy)

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/am-pdf/10.1063/1.4928870

Reference24 articles.

1. Plasma etching: Yesterday, today, and tomorrow

2. T. Makabe and Z. Lj. Petrovic , Plasma Electronics: Applications in Microelectronic Device Fabrication, 2nd ed. ( CRC Press, 2014).

3. Electron energy distribution functions and the influence on fluorocarbon plasma chemistry

4. Electron energy distribution function control in gas discharge plasmas

5. Low‐temperature, uniform, and high‐density plasma produced by a new ultra‐high‐frequency discharge with a spokewise antenna

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