Adsorption-controlled growth of homoepitaxial c-plane sapphire films

Author:

Majer Lena N.1ORCID,Acartürk Tolga1ORCID,van Aken Peter A.1ORCID,Braun Wolfgang1ORCID,Camuti Luca12ORCID,Eckl-Haese Johan1ORCID,Mannhart Jochen1ORCID,Onuma Takeyoshi3ORCID,Rabinovich Ksenia S.1ORCID,Schlom Darrell G.456ORCID,Smink Sander1ORCID,Starke Ulrich1ORCID,Steele Jacob4ORCID,Vogt Patrick17ORCID,Wang Hongguang1ORCID,Hensling Felix V. E.14ORCID

Affiliation:

1. Max Planck Institute for Solid State Research 1 , 70569 Stuttgart, Germany

2. Ludwig-Maximilians-Universität, Department of Chemistry 2 , 80539 Munich, Germany

3. Department of Applied Physics, Kogakuin University 3 , 2665-1, Hachioji, Tokyo 192-0015, Japan

4. Department of Materials Science and Engineering, Cornell University 4 , Ithaca, New York 14853, USA

5. Kavli Institute at Cornell for Nanoscale Science 5 , Ithaca, New York 14853, USA

6. Leibniz-Institut für Kristallzüchtung 6 , 12849 Berlin, Germany

7. Institut für Festkörperphysik, Universität Bremen 7 , 28359 Bremen, Germany

Abstract

Sapphire is a technologically highly relevant material, but it poses many challenges when performing epitaxial thin-film deposition. We have identified and applied the conditions for adsorption-controlled homoepitaxial growth of c-plane sapphire. The films thus grown are atomically smooth, have a controlled termination, and are of outstanding crystallinity. Their chemical purity exceeds that of the substrates. The films exhibit exceptional optical properties, such as a single-crystal-like bandgap and a low density of F+ centers.

Publisher

AIP Publishing

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