Hydrogen plasma passivation of InP: Real time ellipsometry monitoring and ex situ photoluminescence measurements-Reference-Cited by-同舟云学术

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Hydrogen plasma passivation of InP: Real time ellipsometry monitoring and ex situ photoluminescence measurements

Published:1996-07-29 Issue:5 Volume:69 Page:685-687
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Bruno G.,Losurdo M.,Capezzuto P.,Capozzi V.,Trovato T.,Perna G.,Lorusso G. F.

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.117806

Reference16 articles.

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Stability of Nanometer-Thick Layered Gallium Chalcogenides and Improvements via Hydrogen Passivation;ACS Applied Nano Materials;2023-10-26

2. The breakdown voltage characteristics and the secondary electron production in direct current hydrogen discharges for the gaps ranging from 1 μm to 100 μm;Physics Letters A;2012-02

3. Interfacial analysis of InP surface preparation using atomic hydrogen cleaning and Si interfacial control layers prior to MgO deposition;Applied Surface Science;2010-10

4. Structural and optical properties of GaAs(001) surfaces thermally annealed in dry N2 atmosphere;Journal of Applied Physics;2009-06-15

5. Properties of GaP(001) surfaces thermally annealed in dry N2 atmosphere;Journal of Applied Physics;2008-05

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