Quantification of the hysteresis and related phenomena in reactive HiPIMS discharges-Reference-Cited by-同舟云学术

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Quantification of the hysteresis and related phenomena in reactive HiPIMS discharges

Published:2017-03-06 Issue:17 Volume:121 Page:171905
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:J. Appl. Phys.

Author:

Britun Nikolay¹,Konstantinidis Stephanos¹,Belosludtsev Alexandr²^ORCID,Silva Tiago³,Snyders Rony¹⁴

Affiliation:

1. Chimie des Interactions Plasma-Surface (ChIPS), CIRMAP, Université de Mons, 23 Place du Parc, B-7000 Mons, Belgium

2. Department of Physics and NTIS, University of West Bohemia, Univerzitní 8, 306 14 Plzeň, Czech Republic

3. Instituto de Plasmas e Fusão Nuclear, Instituto Superior Técnico, Universidade de Lisboa, 1049-001 Lisboa, Portugal

4. Materia Nova Research Center, Parc Initialis, B-7000 Mons, Belgium

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Reference58 articles.

1. D. V. Mozgrin , I. K. Fetisov , and G. V. Khodachenko , Plasma Phys. Rep. 21, 400 (1995).

2. Pulsed probe diagnostics of a high-current low-pressure discharge in crossed ExH fields

3. Impulse irradiation plasma technology for film deposition

4. A novel pulsed magnetron sputter technique utilizing very high target power densities

5. The high power impulse magnetron sputtering discharge as an ionized physical vapor deposition tool

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