Return of target material ions leads to a reduced hysteresis in reactive high power impulse magnetron sputtering: Model
Author:
Affiliation:
1. HVM Plasma, Na Hutmance 2, 15800 Praha, Czech Republic
2. Department of Physics and NTIS – European Centre of Excellence, University of West Bohemia, Plzeň, Czech Republic
Funder
European Social Fund (ESF)
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4977815
Reference45 articles.
1. Modeling of reactive sputtering of compound materials
2. Hysteresis effect in reactive sputtering: a problem of system stability
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4. Modeling of inhomogeneous film deposition and target erosion in reactive sputtering
5. Fundamental understanding and modeling of reactive sputtering processes
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