Temperature dependence of silicon nitride etching by atomic fluorine
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.342555
Reference14 articles.
1. Low-resistance AuZn gate ohmic contacts for InP JFETs
2. The Roles of Ions and Neutral Active Species in Microwave Plasma Etching
3. The reaction of fluorine atoms with silicon
4. Reaction of fluorine atoms with SiO2
5. Photoresist Stripping Using a Remote Plasma: Chemical and Transport Effects
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