Field-enhanced Si–Si bond-breakage mechanism for time-dependent dielectric breakdown in thin-film SiO2 dielectrics
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.119739
Reference2 articles.
1. Acceleration Factors for Thin Oxide Breakdown
2. The silicon-silicon dioxide system: Its microstructure and imperfections
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