Verification of the O–Si–N complex in plasma-enhanced chemical vapor deposition silicon oxynitride films
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2158022
Reference11 articles.
1. Composition and Chemical Structure of Nitrided Silica Gel
2. Use of multilayer techniques for XPS identification of various nitrogen environments in the Si/NH3 system
3. Thermally grownSi3N4thin films on Si(100): Surface and interfacial composition
4. Characterization of silicon oxynitride thin films by x-ray photoelectron spectroscopy
5. Initial stages of the thermal nitridation of the Si(100) surface with NH3 and NO: a surface sensitive study of Si 2p core-level shifts
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