Simulation results of the gas rarefaction and target ion evolution in a chopped high power impulse magnetron sputtering discharge
Author:
Affiliation:
1. School of Materials Science and Engineering, Hainan University, Haikou 570228, China
2. Plasma Physics and Materials Laboratory, Beijing Institute of Graphic Communication, Beijing 102600, China
Funder
National Natural Science Foundation of China
Hainan Provincial Natural Science Foundation of China
Scientific Research Project Funding of Hainan Higher Education Institution
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
https://aip.scitation.org/doi/pdf/10.1063/5.0062990
Reference25 articles.
1. A novel pulsed magnetron sputter technique utilizing very high target power densities
2. Discharge physics of high power impulse magnetron sputtering
3. Reactive HiPIMS deposition of Ti-Al-N: Influence of the deposition parameters on the cubic to hexagonal phase transition
4. Ion-flux characteristics during low-temperature (300 °C) deposition of thermochromic VO2 films using controlled reactive HiPIMS
5. Superhard nanocomposite nc-TiC/a-C:H coatings: The effect of HiPIMS on coating microstructure and mechanical properties
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