1. E-beam writing: a next-generation lithography approach for thin-film head critical features
2. For example, W. Stallings, Computer Organization and Architecture (MacMillan, New York, 1987), p. 90.
3. J. L. Hennessy and D. A. Patterson, Computer Organization and Design (Morgan Kaufmann, San Francisco, 1998), p. 544.
4. Jan M. Rabaey, Digital Integrated Circuits (Prentice Hall, Saddle Hill, NJ, 1996), p. 578.
5. Challenges and future directions for the scaling of dynamic random-access memory (DRAM)