Effect of stress on the transformation of Ni2Si into NiSi
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2949751
Reference21 articles.
1. Compatibility of NiSi in the self-aligned suicide process for deep submicrometer devices
2. Enhancement of thermal stability of NiSi films on (100)Si and (111)Si by Pt addition
3. New salicidation technology with Ni(Pt) alloy for MOSFETs
4. Implanted noble gas atoms as diffusion markers in silicide formation
5. Kinetics of formation of silicides: A review
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