Stress relaxation technique for thermally grown SiO2
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.97205
Reference22 articles.
1. Stress in thermal SiO2during growth
2. The Optical Constants of Silicon and Dry Oxygen Oxides of Silicon at 5461A
3. On the Kinetics of the Thermal Oxidation of Silicon: I . A Theoretical Perspective
4. On the Kinetics of the Thermal Oxidation of Silicon: I . A Theoretical Perspective
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