Analysis and application of a viscoelastic model for silicon oxidation
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.357450
Reference25 articles.
1. Characterization of Poly‐Buffered LOCOS in Manufacturing Environment
2. A general solution method for two-dimensional nonplanar oxidation
3. Finite-Element Simulation of Local Oxidation of Silicon
4. A New Two-Dimensional Silicon Oxidation Model
5. NOVEL: A NONLINEAR VISCOELASTIC MODEL FOR THERMAL OXIDATION OF SILICON
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