Method for fabricating submicron silicide structures on silicon using a resistless electron beam lithography process
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.118736
Reference16 articles.
1. Fabrication of sub-10 nm structures by lift-off and by etching after electron-beam exposure of poly(methylmethacrylate) resist on solid substrates
2. Lithography using electron beam induced etching of a carbon film
3. Scanning probe anodization: Patterning of hydrogen-terminated silicon surfaces for the nanofabrication of gold structures by electroless plating
4. PtSi contact metallurgy: Effect of silicide formation process
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