Investigation of Back Diffusion of Photoelectrons in Various Standard Gases as It Affects Secondary Electron Emission Coefficients
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1721223
Reference8 articles.
1. The liberation of electrons from metal surfaces by positive ions. Part I.—Experimental
2. The liberation of electrons from metal surfaces by positive ions. Part I.—Experimental
3. Form of Transient Currents in Townsend Discharges with Metastables
4. Mechanisms of Positive and Negative Corona in Hydrogen and Argon between Coaxial Cylindrical Electrodes over an Extended Pressure Range
5. Photoelectric Currents in Gases between Parallel Plates as a Function of the Potential Difference
Cited by 67 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Understanding plasma enhanced chemical vapor deposition mechanisms in tetraethoxysilane-based plasma;Journal of Vacuum Science & Technology B;2023-03-01
2. Effect of voltage polarity and supply frequency on the properties of plasma contacting liquid electrodes and gold nanoparticle synthesis;Plasma Sources Science and Technology;2022-01-01
3. Material dependent modeling of secondary electron emission coefficients and its effects on PIC/MCC simulation results of capacitive RF plasmas;Plasma Sources Science and Technology;2019-03-25
4. Photoelectron extraction efficiency into Ar-CF4 and Xe-CF4 gas mixtures;Journal of Instrumentation;2018-09-03
5. Gradual increase in secondary ionization coefficientγand charge accumulation on a dielectric electrode during DBD with repeated breakdown;Plasma Sources Science and Technology;2015-09-16
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3