The interplay between surface charging and microscale roughness during plasma etching of polymeric substrates
Author:
Affiliation:
1. Institute of Nanoscience and Nanotechnology, National Center for Scientific Research “Demokritos,” Agia Paraskevi 15310, Greece
2. Department of Materials Science and Engineering, University of Ioannina, Ioannina 45110, Greece
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.5018313
Reference57 articles.
1. Controlling roughness: from etching to nanotexturing and plasma-directed organization on organic and inorganic materials
2. Plasma Etching of Poly(dimethylsiloxane): Roughness Formation, Mechanism, Control, and Application in the Fabrication of Microfluidic Structures
3. Hierarchical micro and nano structured, hydrophilic, superhydrophobic and superoleophobic surfaces incorporated in microfluidics, microarrays and lab on chip microsystems
4. Plasma Micro-Nanotextured, Scratch, Water and Hexadecane Resistant, Superhydrophobic, and Superamphiphobic Polymeric Surfaces with Perfluorinated Monolayers
5. Plasma Nanotextured Polymeric Surfaces for Controlling Cell Attachment and Proliferation: A Short Review
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