Production of large diameter microwave plasma using an annular slot antenna
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.110905
Reference15 articles.
1. Microwave plasma: its characteristics and applications in thin film technology
2. Electron cyclotron resonance microwave discharges for etching and thin‐film deposition
3. Low Temperature Chemical Vapor Deposition Method Utilizing an Electron Cyclotron Resonance Plasma
4. Production of a Large-Diameter Uniform ECR Plasma with a Lisitano Coil
5. 8” Uniform Electron Cyclotron Resonance Plasma Source Using a Circular TE01Mode Microwave
Cited by 22 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Temporal Variations of Optical Emission Spectra in Microwave-Excited Plasma in Saturated Water Vapor under Reduced Pressure during Photoresist Removal;Journal of Photopolymer Science and Technology;2021-06-11
2. Planar Plasma of 30 cm Diameter Maintained by Hybrid Surface Microwave through Annular Slot Antenna;Japanese Journal of Applied Physics;2006-10-24
3. Surface morphology and optical properties of thin films of thiophene-based binary blends;Journal of Applied Physics;2005-07
4. Parameters and equilibrium profiles for large-area surface-wave sustained plasmas;Physical Review E;2002-04-11
5. Electrodynamic Model of the Gas Discharge Sustained by Azimuthal Surface Waves;Contributions to Plasma Physics;2001-07
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3