Triple crystal x‐ray diffraction analysis of chemical‐mechanical polished gallium arsenide
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.351995
Reference28 articles.
1. X-Ray diffraction observation of surface damage in chemical-mechanical polished gallium arsenide
2. Bromine/Methanol Polishing of <100> InP: II . Dependence on Bromine Concentration
3. Evaluation of Fabrication Damage in GaAs Wafers
4. Comprehensive investigation of polish‐induced surface strain in 〈100〉 and 〈111〉 GaAs and InP
5. Polish‐induced damage in 〈100〉 GaAs: A comparison of transmission electron microscopy and Raman spectroscopy
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